Surface step effects on Si (100) under uniaxial tensile stress, by atomistic calculations
نویسندگان
چکیده
منابع مشابه
Step free energies, surface stress, and adsorbate interactions for Cl-Si„100... at 700 K
The evolution and equilibrium morphology of Si~100! with 0.1 monolayer of adsorbed Cl was studied at 700 K with variable temperature scanning tunneling microscopy. Chlorine caused surface roughening with monolayer pits and regrowth islands. The aspect ratio of these features then increased with their size because of the surface-stress anisotropy. By analyzing the equilibrium feature shape as a ...
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ژورنال
عنوان ژورنال: Scripta Materialia
سال: 2002
ISSN: 1359-6462
DOI: 10.1016/s1359-6462(02)00183-5